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电场调控增强型背照式单光子雪崩二极管
李聪, 王哲, 杨旭, 田娜, 冯鹏, 窦润江, 于双铭, 刘剑, 吴南健, 李传波, 刘力源
集成电路与嵌入式系统 ›› 2024, Vol. 24 ›› Issue (10) : 1-8.
PDF(12311 KB)
PDF(12311 KB)
电场调控增强型背照式单光子雪崩二极管
Field-controlled enhancement backside-illuminated single photon avalanche diode
本研究利用搭建的仿真设计平台开发了一款电场调控增强型背照式单光子雪崩二极管(SPAD)器件,通过调控SPAD雪崩区电场,进一步提升了背照式器件的光子探测效率,降低了暗计数率。仿真结果表明,本研究设计的SPAD在水平和垂直电场的协同作用下,有效提高了电子倍增效率,峰值探测效率达到50.1%,在过偏压为3 V时,暗计数率降低至764 Hz。本文对比分析了不同耗尽层厚度和P-Well半径对电场调控增强型背照式SPAD器件性能的影响,并确定了最优结构尺寸。研究结果为基于SPAD的高精度光电探测应用提供了新的技术途径,为SPAD器件在科学研究和工业应用中的进一步发展奠定了基础。
This study developed a Field-Controlled Enhancement Backside-Illuminated Single-Photon Avalanche Diode (SPAD) device using a simulation design platform. By adjusting the electric field in the avalanche region of the backside-illuminated SPAD, the photon detection efficiency was further improved, and the dark count rate was reduced. Simulation results indicate that the SPAD design effectively enhances electron multiplication efficiency through the synergistic effect of horizontal and vertical electric fields, achieving a peak detection efficiency of 50.1%. At an excess bias voltage of 3 V, the dark count rate decreased to 764 Hz. The study compares and analyzes the effects of different depletion layer thicknesses and P-Well radius on the performance of the field-controlled enhanced backside SPAD device, determining the optimal structural dimensions. The results provide a new technical approach for high-precision photoelectric detection applications based on SPAD and lay the groundwork for further development and application of SPAD technology in scientific research and industrial applications.
单光子雪崩二极管 / 背照式 / 光子探测效率 / 暗计数率 / 电场调控 / 器件仿真
SPAD / back illumination / photon detection efficiency / dark count rate / electric field regulation / device simulation
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