基于IBIS模型的FPGA总剂量效应建模方法

张晓鹏, 刘锦辉, 梁博, 谭雯丹, 张馨丹, 刘刚

集成电路与嵌入式系统 ›› 2023, Vol. 23 ›› Issue (7) : 44-48.

PDF(1158 KB)
PDF(1158 KB)
集成电路与嵌入式系统 ›› 2023, Vol. 23 ›› Issue (7) : 44-48.
新器件新技术

基于IBIS模型的FPGA总剂量效应建模方法

  • 张晓鹏, 刘锦辉, 梁博, 谭雯丹, 张馨丹, 刘刚
作者信息 +

Modeling Method of FPGA Radiation Effect Based on IBIS Model

  • Zhang Xiaopeng, Liu Jinhui, Liang Bo, Tan Wendan, Zhang Xindan, Liu Gang
Author information +
文章历史 +

摘要

提出了一种基于输入/输出缓冲区信息规范的FPGA的TID效应建模方法。将FPGA电路结构划分为3部分:输入缓冲区、输出缓冲区、逻辑功能区。缓冲区模型基于IBIS模型使用VHDL-AMS建立,功能区模型基于特定需求采用VHDL建立。针对基于IBIS模型的建模需要,测量了FPGA在0 krad(Si)、820 krad(Si)和2.52 Mrad(Si)的IBIS模型和端口电平数据。通过对比仿真结果和试验结果,验证了所建模型能够反映FPGA受TID效应影响后的电平转换时间变长现象,结果误差在30%以内。所提建模方法为评估数字器件的TID效应提供了模型支撑,对数字系统抗辐射加固具有一定参考意义。

Abstract

A method for modeling the TID effect of FPGA is proposed based on the Input/Output Buffer Information Specification (IBIS).The structure of the FPGA circuit is divided into three parts:the input buffer,the output buffer and the logic functional area.The buffer model is modeled using VHDL-AMS based on the IBIS model,and the functional area model is developed using VHDL based on specific requirements.The IBIS model and port level data for the FPGA at 0 krad(Si),820 krad(Si) and 2.52 Mrad(Si) are measured for the IBIS model based modeling requirements.Comparison of the simulations with the experimental data shows that the proposed model reflects the effect of a longer level transition time after the FPGA is impacted by the total dose effect,and the error between the simulated and experimental results is within 30%.The proposed modeling method provides model support for evaluating the TID effect of digital components and is valuable for anti-radiation of digital systems.

关键词

FPGA / 总剂量效应 / IBIS模型 / 混合信号模型 / 电平转换时间

Key words

FPGA / total inoizing dose / IBIS Model / mixed signal model / level transition time

引用本文

导出引用
张晓鹏, 刘锦辉, 梁博, 谭雯丹, 张馨丹, 刘刚. 基于IBIS模型的FPGA总剂量效应建模方法[J]. 集成电路与嵌入式系统. 2023, 23(7): 44-48
Zhang Xiaopeng, Liu Jinhui, Liang Bo, Tan Wendan, Zhang Xindan, Liu Gang. Modeling Method of FPGA Radiation Effect Based on IBIS Model[J]. Integrated Circuits and Embedded Systems. 2023, 23(7): 44-48
中图分类号: TP31   

参考文献

[1] Schwank J R,Shaneyfelt M R,Fleetwood D M,et al.Radiation Effects in MOS Oxides[J].IEEE Transactions on Nuclear Science,2008,55(4):1833-1853.
[2] A V Kuzminova,N A Kulikov,V D Popov.Investigation into Radiation Effects in a p-Channel MOS Transistor[J].Semiconductors,2020,54(8):877-881.
[3] Lee M,Cho S,Lee N,et al.New Radiation-Hardened Design of a CMOS Instrumentation Amplifier and its Tolerant Characteristic Analysis[J].Electronics,2020.
[4] Seixas L E,Gonalez O L,Souza R,et al.Minimizing the TID effects due to gamma rays by using diamond layout for MOSFETs[J].J. Mater. Sci. Mater. Electron,2019(30):4339-4351.
[5] Deval Y,Lapuyade H,Rivet F.Design of CMOS integrated circuits for radiation hardening and its application to space electronics[C]//2019 IEEE 13th International Conference on ASIC (ASICON).IEEE,2019.
[6] Y B Huang,B Li,L Yang,et al.Three-dimensional TCAD Simulation Study of the Total Ionizing Dose Effect on Bulk nFinFET[J].Microelectron. Comput,2018,35(8):42-47.
[7] 杨变霞,李平,刘洋. NMOS晶体管的总剂量辐射效应仿真[J].固体电子学研究与进展,2015,35(2):187-190,201.
[8] S Ashrafi,B Eslami.Investigation of sensitivity and threshold voltage shift of commercial MOSFETs in gamma irradiation[J].Nucl. Sci. Tech.,2016,27(6):144.
[9] Jafari H,Feghhi S,Boorboor S.The effect of interface trapped charge on threshold voltage shift estimation for gamma irradiated MOS device[J].Radiation Measurements,2015(73):69-77.
[10] Esqueda I S,Barnaby H J,King M P.Compact Modeling of Total Ionizing Dose and Aging Effects in MOS Technologies[J].IEEE Transactions on Nuclear Science,2015,62(4):1501-1515.
[11] Esqueda I S,Barnaby H J,Holbert K E,et al.Modeling of Ionizing Radiation-Induced Degradation in Multiple Gate Field Effect Transistors[J].Nuclear Science IEEE Transactions on,2011,58(2):499-505.
[12] Ilik S,Kabaoglu A,Solmaz N S,et al.Modeling of Total Ionizing Dose Degradation on 180-nm n-MOSFETs Using BSIM3[J].IEEE Transactions on Electron Devices,2019,66(11):4617-4622.
[13] Chen W H,Du L,Zhuang Y Q,et al.A model considering the ionizing radiation effects in MOS structure[J].Acta Physica Sinica,2009,58(6):4090-4095.
[14] Gao W,Wu M,Tang Y,et al.Total-Ionization-Dose Radiation-Induced Noise Modeling and Analysis of a 2k × 2k 4T CMOS Active Pixel Sensor for Space Applications[J].IEEE Sensors Journal,2018(18):8053-8063.
[15] Huang J Q,He W W,Chen J,et al.New Method of Total Ionizing Dose Compact Modeling in Partially Depleted Silicon-on-Insulator MOSFETs[J].Chinese Physics Letters,2016,33(9):96-101.
[16] Lee M,Lee N,Kim J,et al.Modeling and Simulation-Based Layout Optimization for Tolerance to TID Effect on n-MOSFET[J].Electronics,2021(8).
[17] Zhang C M,Jazaeri F,Borghello G,et al.Characterization and Modeling of Gigarad-TID-induced Drain Leakage Current of 28-nm Bulk MOSFETs[J].IEEE Transactions on Nuclear Science,2019,66(1):38-47.
[18] Wang X,Huang J,Wang K,et al.A Concise Numerical TID Radiation Model for n-MOSFET with Nano-Scaled LOCOS Isolation Under Zero Gate Bias[J].Nanoscience & Nanotechnology Letters,2014,6(9):840-844.
[19] Arma A K,Steer M,Franzon P D.Improving Behavioral IO Buffer Modeling Based on IBIS[J].IEEE Transactions on Advanced Packaging,2008,31(4):711-721.
[20] 刘太彬.基于IBIS的数字集成电路行为级建模方法研究[D].西安:西安电子科技大学,2018.
[21] Chu X,Hwang C,Fan J,et al.Analytic Calculation of Jitter Induced by Power and Ground Noise Based on IBIS I/V Curve[J].IEEE Transactions on Electromagnetic Compatibility,2017,60(2):468-477.
[22] 曹烨政.CMOS数字集成电路总剂量效应建模研究[D].西安:西安电子科技大学,2021.

PDF(1158 KB)

Accesses

Citation

Detail

段落导航
相关文章

/