基于深沟槽单次外延工艺超级结MOS器件耐压提升与优化
田俊, 付振, 张泉, 肖超, 张文敏, 王悦
Voltage enhancement and optimization of super junction MOS devices based on deep trench single epitaxial process
TIAN Jun, FU Zhen, ZHANG Quan, XIAO Chao, ZHANG Wenmin, WANG Yue
集成电路与嵌入式系统 . 2024, (6): 46 -54 .