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Figure/Table detail
Compact modeling of I-V model for gate-all-around field effect transistors
WANG Shichun, FENG Junjie, ZHANG Baoqin, HAN Yujie, XU Chuanzhong, ZENG Xia, YU Fei
Integrated Circuits and Embedded Systems
, 2024, 24(
10
): 9-18. DOI:
10.20193/j.ices2097-4191.2024.0022
参 数
图4
~
图7
中数据
图8
~
图9
中数据
N
a
/cm
-3
10
13
10
13
g
c
1
/(cm
-3
eV
-1
)
10
18
10
18
E
1
/V
0.161
0.161
V
fb
/V
-1
-1.1
t
ox
/nm
5
5
R/nm
10
10
L/nm
14
14
μ
s
/(cm
2
V
-1
s
-1
)
—
12
μ
0
/(cm
2
V
-1
s
-1
)
—
88
θ
1
—
-0.09
θ
2
—
-0.28
θ
3
—
-0.05
V
Q
/V
—
0.164
V
i
/V
—
0.585
k
n
—
0.01
Table 1
Parameters for simulation
Other figure/table from this article
Fig. 1
3D structural diagram of GAAFET and GAAFET cross-sectional view
[
13
]
Fig. 2
Distribution of various charge densities under different doping concentrations
Fig. 3
The relationship curve between different types of charge density and surface potential
Fig. 4
Based on region division method
Fig. 5
Based on effective charge density method
Fig. 6
The relationship between surface potential and gate voltage under different channel voltages
Fig. 7
The relationship between surface potential and gate voltage under different doping concentrations
Fig. 8
Comparison between model and experimental results based on region division method
Fig. 9
Comparison between model and experimental results based on effective charge density method