TDDB lifetime prediction and model applicability for gate oxide in 55 nm technology
Shan Shushan, Lu Xiangbin, Qin Haobin, Fang Liquan, Zheng Feijun
Integrated Circuits and Embedded Systems . 2026, (11): 83 -90 .  DOI: 10.20193/j.ices2097-4191.2026.0086